http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20050121139-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_86289527b50fd2a67582530a0dd8d129 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-40 |
| filingDate | 2004-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4831b5f815501bda677b84870c6d6ec5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82b7e1b3fe7d9287d59bbf9dc217c17b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d614ae74eb745e8a92e7fc29b147ebc1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1bf9bd6b0707c9bff180cef33830f6ce http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_64ad08c4284bf8ac56773a0313671403 |
| publicationDate | 2005-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20050121139-A |
| titleOfInvention | Method of coating cerium dioxide on nano-sized silicon dioxide by using rf plasma |
| abstract | The invention of silicon dioxide by RF plasma (SiO 2) relates to a process for film deposition dioxide and cerium (CeO 2) in the nano particles, after producing the SiO 2 nanoparticles and producing the CeO 2 precursor wherein the SiO 2 nano the processes the RF plasma the particles and the CeO 2 precursor CeO 2 coatings i.e. after the composite a thin film deposited SiO 2 particles to take the SEM images confirm the CeO 2 thin film deposited by the RF plasma, and CeO 2 thin film deposited before / after pH by comparing the zeta potential according to the for the SiO 2 particles have their surface properties to lose CeO 2 of surface chemical properties by ensuring that the gain physical of SiO 2 properties and (chemical Mechanical Polishing) CMP that can take advantage of a chemical surface properties of CeO 2 There is a very good effect of providing abrasive particles. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100861729-B1 |
| priorityDate | 2004-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.