| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2059 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28 |
| filingDate |
2004-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6068319f9279ed74d41db69dc719c517
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b4d423e3fa983b099420c2d380eaa75
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abe0bf00aaca69b71750dd5e9834ce5d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e04511b6ef753a717725f9debdfc548 |
| publicationDate |
2005-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20050118310-A |
| titleOfInvention |
Positive photoresist composition and method for forming resist pattern |
| abstract |
Provided are a positive photoresist composition having high etching resistance and high resolution, and capable of forming a fine pattern using an electron beam exposure process, and a resist pattern forming method using the positive photoresist composition. The positive photoresist composition includes a resin component (A) in which alkali solubility increases by the action of an acid, an acid generator component (B) that generates an acid by exposure, and an organic solvent (C). (A) A component consists of a copolymer containing the 1st structural unit (a1) derived from hydroxy styrene, and the 2nd structural unit (a2) derived from the (meth) acrylic acid ester which has an alcoholic hydroxyl group, Part of the hydroxyl group of the structural unit (a1) and the alcoholic hydroxyl group of the structural unit (a2) is a positive photoresist composition for EB, which is protected by an acid dissociable, dissolution inhibiting group. |
| priorityDate |
2003-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |