Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_730848fc69ca7afca2b3c3e10b6cfd92 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-117 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 |
filingDate |
2004-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c6b1f8c0129e7e23d513f517b279f58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_add23135f1e5cfd4c9f0de95dc3cb70f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c440173b3ebefbdb0a8a244263ab270 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da8591dcb333ecbaf2ce4fe384854192 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b31e13e6b990a432c2d7f6a4275b5aa |
publicationDate |
2005-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20050118272-A |
titleOfInvention |
Photosensitive composition and use thereof |
abstract |
The present invention provides a photopolymerizable compound containing two or more side chain unsaturated groups; At least one ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic monomer; At least one nonionic surfactant; And one or more photoinitiators. It is also preferred that the composition comprises at least one amine modified acrylic oligomer and a dye. Other conventional photoresist components such as photosensitizers, adhesion promoters, surface modifiers and solvents may also be included in the composition. Such compositions are useful for forming patterns of microlithographic circuits in a substrate, such as a substrate. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017069431-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10752718-B2 |
priorityDate |
2003-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |