| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_730848fc69ca7afca2b3c3e10b6cfd92 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0166 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-016
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate |
2004-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f47ece7492660304240f3aa2173e509d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4ba6cf60e97c15ecce8ebb84702a0c2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4cd98f094087b2421f9cf1d7d3d72914 |
| publicationDate |
2005-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20050114668-A |
| titleOfInvention |
Photoresist composition for the formation of thick films |
| abstract |
The present invention is directed to photosensitive photoresist compositions particularly useful for the formation of thick films comprising surfactants at concentrations ranging from about 2,000 ppm to about 14,000 ppm by weight of the film-forming alkali-soluble resin, photoactive compound, solvent and total photoresist composition. It is about. Preferably the thickness of the photoresist film is greater than 20 microns. The present invention also provides a method of coating and image forming the photosensitive composition of the present invention. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100896149-B1 |
| priorityDate |
2003-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |