| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-28 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2002-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_75c5e7896cd81053eae8dc081ae85e2d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7499e0c8dbbb9caf64bbc72433d78ab2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6905dfe8fddb653e9dc31517dbe6027b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de9c993ed66f82baae6aa97500ecf35e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_efa468b361066689cdf41ee3391659d7 |
| publicationDate |
2005-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20050112134-A |
| titleOfInvention |
Positive resist composition and method of forming resist pattern from the same |
| abstract |
Resin component (A) which contains a polycyclic group containing acid dissociable dissolution inhibiting group in an ester side chain part, and contains in a main chain the structural unit derived from (meth) acrylic acid ester, and alkali solubility increases by the action of an acid, and exposure As a positive resist composition containing an acid generator component (B) and an organic solvent (C) which generate an acid byn n n The chemically amplified positive resist composition, wherein the component (A) includes both a structural unit derived from methacrylic acid ester and a structural unit derived from acrylic acid ester. With the resist composition, a resist pattern having less surface roughness and line edge roughness at the time of etching, having excellent resolution and having a wide depth of focus is formed. |
| priorityDate |
2001-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |