| abstract |
It contains resin (A1) which has a fluorine atom containing group, a silicon atom containing group, and ethylenic double bond, radical initiator (B), and alkali-soluble photosensitive resin (D) which has 3 or more ethylenic double bond in a molecule | numerator. The photosensitive resin composition. Furthermore, resin (A2) which has a fluorine atom containing group and ethylenic double bond, resin (A3) which has a silicon atom containing group and ethylenic double bond, radical initiator (B), and 3 or more ethylenic 2 in a molecule | numerator The photosensitive resin composition containing alkali-soluble photosensitive resin (D) which has a medium bond. |