http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20050106546-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_154f5a8a983d88f296117dcc92946ab4
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02675
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324
filingDate 2004-05-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f998542423247988802351ecdac0ab3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0601334e1e47cf37dbda341fdacb8435
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e4c9e8936733d437e3dae51b3fefca98
publicationDate 2005-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20050106546-A
titleOfInvention A method for manufacturing polycrystalline semiconductor active layer, the active layer by the same method, and flat panel display with the active layer
abstract The present invention provides a semiconductor active layer crystallization method comprising a laser irradiation step for polycrystallizing a semiconductor active layer, wherein the atmosphere in which the laser irradiation step is performed contains oxygen, and the oxygen content of the atmosphere is determined by the semiconductor active layer crystallization. A semiconductor active layer crystallization method, a semiconductor active layer thereby, and a flat panel display device having the same are provided.
priorityDate 2004-05-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 21.