| abstract |
The present invention provides novel fluorine-containing copolymers comprising at least one fluorinated olefin, at least one polycyclic ethylenically unsaturated monomer having a four-membered heterocyclic conjugate ring, and optionally other components. The copolymers are useful in photoimaging compositions, in particular (positive and / or negative) photoresist compositions for imaging in the manufacture of semiconductor devices. Such copolymers are particularly useful for photoresist compositions having high UV transparency (especially at short wavelengths, for example at 157 nm), useful as substrate resins in resists and potentially many other applications. |