http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20050098227-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-123 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-46 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-46 |
| filingDate | 2004-01-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_461e40ca35d26b50d6747a20c253f5d0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6d4ed423cd88d6f004aed016ba0aed07 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6f3a2e56d89a5bfbd5063d2265267fb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec93e76aded0c96c26e674e3227f1529 |
| publicationDate | 2005-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20050098227-A |
| titleOfInvention | Sulfonium salts, radiation-sensitive acid generators, and positive radiation-sensitive resin compositions |
| abstract | The present invention is a sulfonium salt compound which is excellent in transparency at a wavelength of 220 nm or less, and exhibits excellent performance in sensitivity, resolution, pattern shape, LER, storage stability, etc. when used as a radiation sensitive acid generator, and The positive radiation sensitive resin composition which uses this compound as a radiation sensitive acid generator is provided.n n n The sulfonium salt compound is represented by the following general formula (I).n n n <Formula I>n n n n n n n n Provided that R 1 represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, an -OR 3 group (wherein R 3 is a monovalent alicyclic hydrocarbon group) and the like, and R 2 represents an (substituted) alkyl group Or two or more R 2 combine with each other to form a ring structure, p is 0 to 7, q is 0 to 6, n is 0 to 3, and X − represents a sulfonic acid anion.n n n Moreover, the positive radiation sensitive resin composition of this invention contains the radiation sensitive acid generator containing (A) said sulfonium salt compound, and (B) acid dissociable group containing resin. |
| priorityDate | 2003-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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