| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cbffa3b81b3b862dc7220b5648f5f745 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B32-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82B1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B31-02 |
| filingDate |
2004-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df74766397ce636c5d7b10936d0236ba
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8dd70d231fe9f26d283b91e048d4aca1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db4cf5ddace4585d143ea1e3bc5eec7d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_094ce83df6a08a8627b743110c73c90f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8e443ed7b8a8586720c0aa93cdc69df |
| publicationDate |
2005-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20050095742-A |
| titleOfInvention |
Method for manufacturing a carbon nanotube multilayer pattern using photolithography and dry etching |
| abstract |
The present invention is to form a CNT multilayer film by repeatedly fixing the CNT exposed carboxyl group through an amide bond on the substrate exposed to the amine group, and then CNT multilayer film pattern from the CNT multilayer film using photolithography and dry etching technology Method of forming and heat-treating the CNT multilayer film pattern to obtain a CNT multilayer film pattern having no defect site on the surface, and then surfactants or pi-stacking on the CNT multilayer film pattern without the defect site The present invention relates to a method of manufacturing a CNT multilayer pattern in which various chemical functional groups are exposed by physically fixing a chemical having a possible site.n n n According to the present invention, it is possible to form a clear CNT multilayer film pattern in which the CNT is fixed only in the selected area by solving the problem of the prior art in which the CNT is partially fixed even in the unselected area. In addition, the CNT multilayer pattern in which the chemical functional group according to the present invention is physically fixed and exposed on the surface is useful for manufacturing a biosensor. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100829841-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011129613-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100754984-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101295399-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011129613-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100791260-B1 |
| priorityDate |
2004-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |