| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aa67eb74ea5b96d9f8f2cfdb3b025770 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C4-134
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C4-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C4-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-34 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C4-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C4-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C4-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 |
| filingDate |
2005-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_297fc80948f052e81b22cdd135706d75
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a37476839b490605676414f43f88cbd7 |
| publicationDate |
2005-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20050094766-A |
| titleOfInvention |
Process for producing semi-conductor coated substrate |
| abstract |
The present invention relates to a method for producing a clean substrate for use in semiconductor processing, wherein the substrate is roughened to produce a microfischer therein and then treated with a high concentration of strong acid and coated with a material containing at least one metal oxide. will be. |
| priorityDate |
2004-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |