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filingDate 2004-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab59f89faa5564521ddb2694f5f665c9
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publicationDate 2005-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20050094546-A
titleOfInvention Method of decreasing or remvoing by-product in a process of fabricating semiconductor devices and semiconductor fabrication equipment
abstract Provided are methods for reducing or removing byproducts. According to this method, a reaction chamber; A reaction gas supply pipe for supplying a reaction gas to the reaction chamber; An exhaust pipe discharged from the reaction chamber and connected to the reaction chamber; A plasma trap connected to the exhaust pipe and configured to purify exhaust gas; A pump connected to the plasma trap to discharge exhaust gas; And a metal nitride film forming process using semiconductor manufacturing equipment having a hydrogen supply pipe connected to at least one of the reaction gas supply pipe and the exhaust pipe. Hydrogen is supplied to reduce or remove by-products.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020235873-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113423865-A
priorityDate 2004-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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