http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20050085668-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d5d04736b0b882a4f5a1e0e0e4cd8cbb |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133512 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D17-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1335 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09C1-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09C3-10 |
| filingDate | 2003-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c8de5fc0e2b5efc703199929e3a2cfd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d47b5eaed7d5d6b4b21b96400a83b549 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ff42fe25e85e7b8d9a261a4d188c671 |
| publicationDate | 2005-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20050085668-A |
| titleOfInvention | Color filter black matrix resist composition and carbon black dispersion composition used for the composition |
| abstract | The present invention relates to a color filter black containing (A) a copolymer having carbon black, an amino group and / or a quaternary ammonium salt having (A) specific physical properties (average primary particle size, concentration of surface carboxyl groups), and (C) an organic solvent. Color filter containing the carbon black dispersion composition for matrix resist compositions, the above-mentioned dispersion composition, (D) binder resin which has a carboxyl group, (E) ethylenically unsaturated monomer, (F) photoinitiator, and (G) specific polyfunctional thiol compound It provides a black matrix resist composition and easily forms a pattern having high light shielding properties by a thin film and a photolithographic pattern, has excellent storage stability, and exhibits sufficient sensitivity and resolution. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102464340-B1 |
| priorityDate | 2002-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 351.