| abstract |
The present invention is directed to photomask recovery and fabrication using direct recording nanolithography, including the use of scanning probe microscope tips for the deposition of ink materials, including sol-gels and metallic inks. Additional methods can be combined with removable methods. The opening can be filled with nanostructures. The height of the nanostructures filling the openings can be controlled without sacrificing control of the lateral dimensions of the nanostructures. More advanced masks can be used, including glass chromium masks as well as masks for nanoimprint nanolithography. |