| abstract |
The present inventionn n n (a) at least one repeating unit derived from an ethylenically unsaturated compound having at least one fluorine atom covalently bonded to the ethylenically unsaturated carbon atom; Andn n n (b) A polymer having at least one repeating unit derived from an ethylenically unsaturated cyclic compound of formula (I) Such polymers can be used to make photoresist compositions and coated substrates.n n n <Formula I>n n n n n n n n Wheren n n n is 0, 1 or 2;n n n R 1 to R 4 are independently H, C 1 -C 10 alkyl or alkoxy, or C 6 -C 20 aryl, optionally substituted by halogen or ether oxygen. |