http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20050060485-A

Outgoing Links

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
filingDate 2003-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8ec7de15089896c0588abeae5a1de160
publicationDate 2005-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20050060485-A
titleOfInvention Wafer covering system for semiconductor processing equipment
abstract The wafer covering system for semiconductor manufacturing equipment includes an annular covering formed of aluminum and having an anodized protective film and a protective film of ceramic material in close contact with the outer peripheral portion of the wafer to be etched; A driving device for raising and lowering the covering; And a driving pin connecting the covering and the driving device. Here, it is preferable that the outer surface of the covering forms a to-be-protected film, and the outer surface of the covering is formed of a ceramic protective film.
priorityDate 2003-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 18.