| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2707056d594790a62947ee030653e6f8 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13398 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1339 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1339 |
| filingDate |
2003-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8b5c578a1c38faae3a35840624d789f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2b2c1c19049ab545a5394370634b045b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_49bdc507a353ecfc6c7d58d6bd7c78e3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb1598f957b2c44ebe013e7fd0189494
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f49b3bf0a3e919b4c9d22a4986c0259f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e0797e318bda1121051b573bd219438 |
| publicationDate |
2005-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20050059584-A |
| titleOfInvention |
Photoresist composition for column spacer of liquid crystal display |
| abstract |
The present invention relates to a photosensitive resin composition for column spacers of a liquid crystal display device, and more particularly, to a photosensitive resin composition for column spacers of a liquid crystal display device for compensating for nonuniformity of cell gap caused by thickness variation in a patterned column spacer. will be. The present invention provides a photosensitive resin composition for column spacers comprising an alkali-soluble copolymer, a polyfunctional acrylic monomer having two or more ethylenically unsaturated bonds, a compound in the form of urethane having a double bond, a photopolymerization initiator and a solvent. According to the present invention, it is possible to provide a photosensitive resin composition for column spacers having a very high compression displacement and recovery rate as compared with the prior art. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101121038-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101127831-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010002129-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010002129-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100741297-B1 |
| priorityDate |
2003-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |