http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20050048950-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a492183be65153abfa7dec00d51c816 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2003-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec72e12d4077c325ad02dc88ccb08bb3 |
| publicationDate | 2005-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20050048950-A |
| titleOfInvention | Organic anti-reflective coating composition and photoresist pattern-forming method using it |
| abstract | The present invention relates to an organic antireflective coating composition used to improve pattern uniformity in a photoresist ultrafine pattern forming process and a method of forming a photoresist using the same, in particular, a process of forming a photoresist pattern through exposure. An organic anti-reflective coating composition capable of preventing a phenomenon in which a photoresist pattern is damaged or collapsed due to excessive acid generated at an exposure site by the photoacid generator included in the photoresist film and diffused to the non-exposed site, and It relates to the pattern formation method used. Such an organic antireflection film composition of the present invention is characterized in that the organic antireflection film composition comprising a light absorbing agent, a crosslinking agent, a thermal acid generator, and an organic solvent additionally includes a photobase generator. |
| priorityDate | 2003-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 38.