http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20050044806-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6813f68bbadbcaae3828aa035190fede
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
filingDate 2003-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e94f76dec484b602cbc8b0a709a7e89
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_308d3672815387d783761245b4d9df78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_69f277ef11bd44cfaea90c7ee1250d08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6e7d2fbdd880f1ba84e9c26eed53d9f7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3fffdc8c84edf7f56136dacefb081b91
publicationDate 2005-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20050044806-A
titleOfInvention System and method for removing material
abstract Embodiments of the present invention provide for the removal of process material crusts, such as ion-implanted photoresists, from a treatment object. Hydrocarbon gas in combination with oxygen gas is used to generate a halogen-free plasma, allowing the crust to be treated with plasma. Methane may be used as the hydrocarbon gas. The plasma can also be used to remove underlying unchanged photoresist and ion implant related residues. The plasma can be similarly generated using a hydrogen containing gas, which may be pure hydrogen gas, combined with oxygen gas. Several techniques are used that expose the treatment to a hydrogen / oxygen based plasma and then to a hydrocarbon / oxygen based plasma.
priorityDate 2002-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID101175
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425193155
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID410066445
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419524194
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID454105947
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559593
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559573
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID783
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559497
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10037
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6351
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID297
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID86607863
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419531075
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5460631
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7846
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415806325
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID455728551
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10041

Total number of triples: 39.