http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20050043647-A

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filingDate 2004-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_933f977fda2d6ccb7d7120eeca95abf9
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publicationDate 2005-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20050043647-A
titleOfInvention Anti-glare film and display device
abstract The present invention provides an anti-glare film and a method of manufacturing the same, which realize the reduction of the glare of the screen without sacrificing anti-glare property, and provide an image display device having excellent visibility by using the same.n n n As an anti-glare film in which fine irregularities are formed on the surface, the area higher than the average height of the unevenness is convex, and the area lower than the average height of the unevenness is concave, and the projection area of the individual convex or the projection area of the concave is determined to obtain a predetermined area. by obtaining the frequency of the convex ttoeun recess, also when calculating the frequency of the apparent surface area by the predetermined area by the area × frequency, and displays the frequency of the apparent surface area of the obtained convex or concave as a bar graph, the peak value is 300 ㎛ 2 The anti-glare film 20 which appears in the following position and whose half value width of the peak is 60 micrometer < 2> or less is provided. This anti-glare film 20 is arrange | positioned at the visual recognition side of image display means, such as a liquid crystal panel, and an image display apparatus is comprised.n n n A lithography step of forming irregularities in the photoresist film 12 formed on the substrate 11 by photolithography, and the metal 17 is transferred onto the uneven surface of the obtained photoresist film to form an uneven shape. After the transfer to 17), the electroplated metal mold manufacturing process of peeling the metal plate 17 to which the uneven shape was transferred from the photoresist film 13 and manufacturing the mold 18 and the metal plate 18 to which the uneven shape was transferred in this way were carried out. In producing the antiglare film 20 having the unevenness on the surface, which is used as a mold and the uneven shape on the surface thereof is transferred to the surface of the film 20, the lithography step is two kinds of different sizes. This is performed by exposing and subsequently developing the photoresist film 12 through the photomask 14 having the above pattern.
priorityDate 2003-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 42.