| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45544
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
| filingDate |
2003-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_64862d96c71694676103ca3da7e4944a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ac1556f58cdb095aa6df3e07b7e1b80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79b92c48a624d13203e509fa103844ac
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66921344b64b7fce1052c226b1d76f38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87ec151e1495caba45ff6870aa6fda87
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cdb53411be077c962f362218e0870ce0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f77722f6ee20b1d44b598261f98a098
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7ff0146f5f7091908185dea7b289556 |
| publicationDate |
2005-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20050036194-A |
| titleOfInvention |
Source supply apparatus, method of supplying source, and atomic layer deposition method using the same |
| abstract |
Disclosed are a source supply apparatus capable of supplying a sufficient source and easy to maintain, a method of supplying a source using the same, and an atomic layer deposition method. Provided is a source supply apparatus having a source storage vessel containing a gaseous source, a gaseous source filling means, a gaseous source filling container adjacent to the reactor, and a source supplying means for supplying the gaseous source of the source filling container to the reactor. In addition, a source supply method comprising the step of first vaporizing the liquid source with a gaseous source, and then filling the gaseous source in the source filling container, and then supplying the gaseous source of the source filling container to the reactor and an atomic layer deposition method using the same. To provide. It is possible to supply the source sufficiently in a short time without extending the source supply time or raising the source temperature which may cause the source to deteriorate. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016163578-A1 |
| priorityDate |
2003-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |