| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1818
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1809 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 |
| filingDate |
2004-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_68675c92dac1fc72c756bcab27ad2178
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3aa197a0faee499992f0da36115aa856
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ddddaccdf289710274cfa74b079de7c8 |
| publicationDate |
2005-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20050033857-A |
| titleOfInvention |
Novel polymer, positive resist composition, and patterning process using the same |
| abstract |
The present invention provides a positive resist material having high sensitivity and high resolution in exposure with high energy rays and having low line edge roughness and less residue after development because swelling during development is suppressed.n n n The present invention further relates to a polymer compound having at least a repeating unit represented by the following formula (1), a repeating unit represented by the following formula (2) and / or a repeating unit represented by the following formula (3), and a positive resist compounded with the base resin Provide the material.n n n <Formula 1>n n n n n n n n <Formula 2>n n n n n n n n <Formula 3> |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101145545-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101096954-B1 |
| priorityDate |
2003-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |