| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b19eaa8e535da4e4bceed99917a68153 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-00 |
| filingDate |
2004-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_41aaa2380ad51f3afa594bacbe991bae
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_38fa3fa91dfde4ebba316206c35a9f2b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f900417fd7b8912f7887a28742e9f038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d42d3230cec5595dda5d27158a61d26 |
| publicationDate |
2005-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20050029690-A |
| titleOfInvention |
Process for producing a phenolic resin for photo resist, and a composition for photo resist |
| abstract |
This invention is a manufacturing method of the phenol resin for photoresists which has the process of following (a)-(c). (a) reacting phenols with aldehydes to synthesize phenol resin A, (b) reacting phenol resin A and aldehydes dissolved in an organic solvent in the presence of a solid catalyst to synthesize phenol resin B, and (c) A step of separating at least one of the reaction treatment and the concentration treatment after separating the phenol resin B from the solid catalyst. According to the present invention, there is provided a method of efficiently producing a photoresist phenol resin which can reduce the contamination of a production line by sublimation in a photoresist resin and improve productivity, and a phenol resin for photoresist obtained by the production method. The resin composition for photoresists containing is provided. |
| priorityDate |
2003-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |