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filingDate 2004-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d27b38320f0aad5edd4684a0267d9fdf
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publicationDate 2005-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20050022363-A
titleOfInvention Method for patterning organic materials or combinations of organic and inorganic materials
abstract This applicationn n n (1) patterning the water-soluble material "A" on the substrate surface to form a substrate / material "A" surface;n n n (2) depositing an organic or organic / inorganic material "B" on the substrate / material "A" surface; Andn n n (3) lifting off the material "A" in an aqueous solution,n n n Where step (1)n n n (1a) patterning the photoresist material on the substrate surface to form a substrate / photoresist material surface;n n n (1b) depositing a water soluble material “A” on the substrate / photoresist material surface;n n n (1c) lifting off the photoresist material in an organic solvent, orn n n Or else step (1)n n n (1a ') depositing a water-soluble material "A" on the substrate surface to form a substrate / material "A" surface;n n n (1b ') patterning the photoresist material on the substrate / material "A" surface;n n n (1c ') etching the exposed material "A" in an aqueous solution;n n n (1d ') lifting off the photoresist material in an organic solvent,n n n A method of patterning an organic material or organic / inorganic material on a substrate.n n n The present application also relates to the use of the method, the pattern of the organic material or organic / inorganic material produced by the method and the substrate having the pattern. The present application also relates to the use of patterned nanoparticle films.
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