| abstract |
The present invention relates to a monomer photoacid generator composition, specifically, to a composition comprising a monomer photoacid generator and a nonionic surfactant. The present invention also provides a method for synthesizing a compound on a substrate. The method binds a first molecular layer having an acid labile protecting group on a solid substrate and coats the monomer photoacid generator composition layer on the first molecular layer. Next, the composition layer is exposed and heat treated to remove an acid labile protecting group from the first molecule corresponding to the exposed portion, and wash the monomer photoacid generator composition layer to remove it. A second molecule is attached to the activated first molecule. |