http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20050016190-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1809 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1818 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1812 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28 |
filingDate | 2004-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de27a84708e16a423c81ab096f33ceac http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bffa4a732672dd927e60534c6ed14fee http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_41b7953aacf9be75324731242906fc94 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea0add81bb44226ce3a7adcf9dd82631 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94be320ab77e8e1113b2306ca0a89a14 |
publicationDate | 2005-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-20050016190-A |
titleOfInvention | Resist Polymer, Resist Composition and Patterning Process |
abstract | The present invention provides a polymer which is characterized by including at least one repeating unit represented by the following formulas (1) to (4) as a resin in which the dissolution rate in an alkaline developer is increased by the action of an acid.n n n <Formula 1>n n n n n n n n <Formula 2>n n n n n n n n <Formula 3>n n n n n n n n <Formula 4>n n n n n n n n In formula, R < 1> , R < 2> , R < 3> , R < 6> represents a hydrogen atom or a methyl group each independently, R < 4> , R < 5> represents a hydrogen atom or a hydroxyl group each independently, X is any of the following formulas 5a-5d A tertiary exo-alkyl group having a bicyclo [2.2.1] heptane skeleton represented by one is represented, and Y represents a tertiary alkyl group having an adamantane skeleton.n n n <Formula 5a>n n n n n n n n <Formula 5b>n n n n n n n n <Formula 5c>n n n n n n n n <Formula 5d>n n n n n n n n In formula, R < 7> represents a C1-C10 linear, branched or cyclic alkyl group, and a broken line shows a bond position and a bonding direction.n n n The resist material of the present invention produced using the polymer of the present invention is useful for microfabrication for ultra-LSI production by electron beams or far ultraviolet rays because it is sensitive to high energy rays and excellent in terms of resolution and pattern compact dimension difference. |
priorityDate | 2003-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 773.