http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20050008780-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-3011 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5329 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-25 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-532 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B9-04 |
| filingDate | 2003-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2005-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20050008780-A |
| titleOfInvention | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts |
| abstract | The composition for forming a silica-based coating film of the present invention includes a solvent such as siloxane resin such as alkoxysilane as the component (a), an alcohol capable of dissolving the siloxane resin as the component (b), an ammonium salt as the component (c) and the like. and (d) a pyrolytic volatile compound, so that the stress of the film obtained by heat treatment at 150 ° C./3 minutes is 10 MPa, and the dielectric constant of the silica-based film obtained by final curing is less than 3.0. It has a hardening characteristic. As a result, the silica-based coating-forming composition of the present invention can form a silica-based coating having excellent low dielectric properties and adhesiveness and having sufficient mechanical strength. |
| priorityDate | 2002-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 543.