http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20050008147-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_796d810c185cba3842fb7b2698a37677 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate | 2003-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ff35a854c04bbce4767c907a890da89 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d0dd499a11ab4b8dbf1012a3f22a4800 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac99a2e018ea5419304f4eacf46ec804 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfd84cbd6e5a58c8a81c405d38a9b1db |
| publicationDate | 2005-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20050008147-A |
| titleOfInvention | Chemical Addition for Chemical Mechanical Polishing Slurry |
| abstract | The present invention relates to a chemical agent added to a slurry for chemical and mechanical polishing, and more particularly, to a chemical additive comprising a compound of polyoxyethylene and polyoxypropylene and an alkyl phosphate compound.n n n The present invention adds a chemical additive consisting of 50 to 100% by weight of the compound of polyoxyethylene and polyoxypropylene and 0 to 50% by weight of the alkyl phosphate compound to the conventional chemical mechanical polishing slurry to suppress the corrosion of the conditioner in the CMP slurry and post -Greatly improved cleanability during cleaning. |
| priorityDate | 2003-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 63.