http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20050004674-A

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28194
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-092
filingDate 2003-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_75e0f9866811cb15e6592a450e02d9fd
publicationDate 2005-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20050004674-A
titleOfInvention Transistor in a semiconductor device and a method of manufacturing the same
abstract BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transistor of a semiconductor device and a method of manufacturing the same, wherein the gate insulating film is formed into a laminated structure of a nitride-based insulating film and a high dielectric insulating film containing hafnium or zirconium, thereby further reducing the electrical thickness of the gate oxide film. The leakage current through the gate insulating film can be reduced, and in the case of the nMOS transistor, the reliability of the device is prevented from being degraded by the hot carrier flowing into the gate oxide film.In the case of the pMOS transistor, impurities injected into the gate are transferred to the channel region. Disclosed are a transistor of a semiconductor device and a method of manufacturing the same that can prevent diffusion.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100920553-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100754012-B1
priorityDate 2003-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 33.