| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-167
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-111 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F238-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-167
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D165-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-111 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D165-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24 |
| filingDate |
2003-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2005-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20050003363-A |
| titleOfInvention |
Polymeric antireflective coatings deposited plasma enhanced chemical vapor deposition |
| abstract |
The present invention provides an improved method of applying a polymer antireflective coating to a substrate surface and a precursor structure obtained therefrom. In general, the method includes plasma chemical vapor deposition (PECVD) of a polymer on a substrate surface. The PECVD process includes providing a large amount of polymer produced by introducing monomer vapor into a plasma state and then polymerizing the plasma monomer onto the substrate surface with the aid of plasma energy. Most preferred starting monomers are phenylacetylene, 4-ethynyltoluene, and 1-ethynyl-2-fluorobenzene. The method of the present invention is useful for providing a highly matched antireflective coating layer on a representative substrate having ultra-micron (0.25 μm or less) features. The process provides very fast deposition rates compared to conventional chemical vapor deposition (CVD) methods, and is environmentally friendly and economical. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10497893-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016167583-A1 |
| priorityDate |
2002-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |