| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D125-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-24 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2004-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11d08fb1bdc2dabc32da488e630b19c3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3aa197a0faee499992f0da36115aa856
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c6d0f373c2be10f166d26335c12da74b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5ef79ef5316809a8b9310abc92d4ca5 |
| publicationDate |
2004-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20040111154-A |
| titleOfInvention |
Preparation of Polymer and Resist Composition |
| abstract |
The present invention provides a polymer compound comprising a repeating unit represented by the following formula (2), characterized in that for performing a selective deprotection reaction of an acetal group using an acid catalyst to the polymer compound comprising the repeating unit represented by the following formula (1) Provide a method.n n n <Formula 1>n n n n n n n n <Formula 2>n n n n n n n n The polymer compound obtained by the production method of the present invention has a narrower molecular weight distribution than that obtained by the conventional production method, and the dissolution contrast and resolution of the resist film are high by blending these polymer compounds into the resist material as the base resin, and the exposure margin is high. It has the characteristics of excellent process adaptability, good post-exposure pattern shape, and low line edge roughness. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101103199-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7482691-B2 |
| priorityDate |
2003-06-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |