http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20040111115-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2004-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abf92c6162f276a54a5782dd87f205c1 |
| publicationDate | 2004-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20040111115-A |
| titleOfInvention | Positive resist composition and method of forming pattern using the same |
| abstract | (Problem) A positive resist composition for providing a wide process window in the formation of contact holes and limiting the formation of pits in a flow bake, and a patterning method using the same, in fine light processing using far ultraviolet rays, in particular, an ArF excimer laser beam. To provide.n n n (Solution) A repeating unit (a) containing a group which has increased solubility in a developing solution under the action of an acid and becomes alkali-soluble by the action of an acid, a repeating unit (b) containing an alicyclic lactone structure, and a hydroxyl group. A repeating unit (c) containing an alicyclic structure substituted with a methacrylic acid, and a methacrylic acid repeating unit (d), wherein the amount of the methacrylic acid repeating unit is 5 to 18 mol% based on the total repeating unit of the resin Positive resist composition containing resin (A) and compound (B) which generate | occur | produce an acid at the time of irradiation of actinic light or a radiation, and the pattern formation method using the same. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101253105-B1 |
| priorityDate | 2003-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 242.