| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1333
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1368
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2004-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_439e49fb5dc013e56a63556662402bb7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c8712f538fccc6b53e61d3b4fec6e46e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d839018f8ce1e1df25ebb714379d4ab |
| publicationDate |
2004-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20040104407-A |
| titleOfInvention |
Positive photoresist composition for manufacturing substrate provided with integrated circuits and liquid crystal on one substrate and formation method of resist pattern |
| abstract |
Provided is a positive photoresist composition for manufacturing a substrate (for system LCDs) in which an integrated circuit and a liquid crystal display portion are formed on a single substrate having good resolution and DOF characteristics, suitable for i-ray exposure, and having excellent linearity and sensitivity. do. The positive photoresist composition for the system LCD is a positive type obtained by dissolving (A) alkali-soluble resin, (B) naphthoquinone diazide esterified product and (C) phenolic hydroxyl group-containing compound having a molecular weight of 1000 or less in an organic solvent. As a photoresist composition,n n n The component (B) contains an esterification reaction product of a non-benzophenone-based phenolic hydroxyl group-containing compound with 1,2-naphthoquinone diazide sulfonic acid compound, and the color value of the resist composition is 0.15 or less. to be. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100676120-B1 |
| priorityDate |
2003-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |