| abstract |
The present invention provides a resist material containing a basic compound having an imidazole skeleton represented by the following formula (1) and a polar functional group.n n n <Formula 1>n n n n n n n n In formula, R < 1> is an alkyl group which has a C2-C20 polar functional group, and a polar functional group contains one or more hydroxyl group, a carbonyl group, ester group, an ether group, a sulfide group, a carbonate group, a cyano group, or an acetal group. R 2 , R 3 and R 4 are hydrogen atoms, alkyl groups having 1 to 10 carbon atoms, aryl groups having 6 to 10 carbon atoms, or aralkyl groups having 7 to 10 carbon atoms.n n n The resist material prepared by blending the basic compound of the present invention is excellent in resolution and focus margin, and is useful for microfabrication using electron beams or far ultraviolet rays. |