| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33c922e05f6133b7d72dbb849d77487d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A63B2071-0625
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A63B2220-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A63B2220-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A63B2230-04 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A63B24-0062 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate |
2003-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f38a1a1355590a881f4ac8efcb125bbc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a8f14570d115624c1cd21d2aae4dacc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e207e481c2843bf7f455185d5335516
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e492897432d8c07412287002c36a7864 |
| publicationDate |
2004-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20040098751-A |
| titleOfInvention |
Photoresist stripper composition |
| abstract |
The present invention relates to a stripper composition for photoresists used in the manufacture of semiconductor devices and liquid crystal display devices, more specifically: a) 5 to 50% by weight of a water-soluble organic amine compound; b) 20 to 70 wt% of a protic alkylene glycol monoalkylether compound having a boiling point of at least 150 ° C. or more; c) 0.01 to 70 weight percent of a polar aprotic solvent; d) 0.01 to 5% by weight of a peel accelerator; And e) 0.01 to 5% by weight of a corrosion inhibitor.n n n The present invention can easily remove the modified photoresist film during a photolithography process in a short time even at high temperature and low temperature, and less corrosion on the aluminum or aluminum alloy conductive film and insulating film under the photoresist without using isopropanol as an intermediate cleaning solution. The stripper composition for photoresists can be provided. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11402759-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11460778-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100794465-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9865475-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110376854-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110376854-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014137173-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20050087357-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8389454-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170107351-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150049674-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190119544-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7658803-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100846057-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100913048-B1 |
| priorityDate |
2003-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |