| abstract |
The present invention provides a photoresist resin, a method for producing the same, a resin composition for a photoresist, and a photoresist using the same, which can reduce contamination of a production line due to sublimation in a photoresist resin, thereby improving productivity.n n n A resin for photoresists obtained by reacting phenols containing m-cresol with 2,6-dimethylol-p-cresol in the presence of an acidic catalyst, and further reacting with aldehydes if necessary. Can be obtained. |