http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20040084278-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_81b47fbe5aa778515cf2edf48283af35 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-1804 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-18 |
| filingDate | 2003-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9261683dd2a5958b27cac276b26439ee http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a4d730a23208172439d43c836a8d8366 |
| publicationDate | 2004-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20040084278-A |
| titleOfInvention | Process for preparation of vinylalkoxysilane with high purity |
| abstract | The present invention relates to a method for producing high purity vinylalkoxysilane, and more particularly, hydrochloric acid which is a byproduct during the reaction while synthesizing vinylalkoxysilane by reacting vinylchlorosilane and alcohol in the presence of an inert solvent is in situ with ammonia gas. Reacts to produce and remove ammonium chloride precipitate to produce high purity vinylalkoxysilane. According to the present invention, hydrochloric acid, which is produced as a by-product of the production of vinyl alkoxysilane, can be reacted with ammonia gas in situ to treat hydrochloric acid in an eco-friendly and economical manner. A high purity vinylalkoxysilane having the following residual chlorine content and a high boiling point within 2% can be obtained. |
| priorityDate | 2003-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 47.