http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20040083336-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095 |
| filingDate | 2002-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2004-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20040083336-A |
| titleOfInvention | Two-Layer Film and Method of Forming Pattern with the Same |
| abstract | The present invention relates to a method for forming a film by deposition and / or sputtering by a lift-off technique, and it is possible to easily form a two-layer resist film having a film layer without burr on the substrate surface. The pattern forming method comprises a positive radiation-sensitive resin composition comprising (A) a radical polymer having a hydroxyl group and / or a carboxyl group, a (B) quinonediazide group-containing compound, and (C) a solvent on a substrate (1). A resist film formed of a positive radiation-sensitive resin composition comprising a resist film (2) formed with a resin, (D) a polymer having a phenolic hydroxyl group, (E) a quinonediazide group-containing compound, and (F) a solvent ( It characterized by comprising the step of forming a two-layer laminated film comprising a 3). |
| priorityDate | 2002-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 270.