http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20040077694-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2002-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2004-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20040077694-A |
| titleOfInvention | Radiation-sensitive resin composition and process for formation of patterns |
| abstract | According to the present invention, there is provided a radiation-sensitive resin composition containing an alicyclic olefin resin having an acid group, an acid generator, a crosslinking agent, and a solvent, wherein the alicyclic olefin resin having an acid group has a weight average molecular weight of less than 10000. In the case, the index C1 represented by the formula (1) is 300 or more, and when the weight average molecular weight is 10000 or more, the index C2 represented by the formula (2) is 120 or more. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-200485770-Y1 |
| priorityDate | 2001-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 340.