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publicationDate 2004-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20040075564-A
titleOfInvention Apparatus and method for collecting impurity
abstract In an apparatus and method for collecting impurities remaining on a semiconductor substrate, the rotary chuck adsorbs and rotates the semiconductor substrate. The first scanning solution droplet formed on the lower surface of the scanning nozzle scans the upper surface of the semiconductor substrate to collect the first impurity from the upper surface of the semiconductor substrate. The lower edge portion of the semiconductor substrate disposed in the vertical direction by the drive unit is in contact with the second scanning solution contained in the scanning container. The rotary chuck rotates the semiconductor substrate such that the second scanning solution collects the second impurity from the edge portion of the semiconductor substrate.
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