http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20040074740-A

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B63B22-04
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filingDate 2003-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c35ee3acfb14ca9ff162ba8ee8a238f3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_987b733b62b137370bbd65e9c1e4f697
publicationDate 2004-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20040074740-A
titleOfInvention Equipment of depositing oxide
abstract An oxide film deposition apparatus capable of forming an oxide film having a uniform concentration is provided. The oxide film deposition facility is connected to at least two chemical liquid raw material tanks for storing at least two chemical liquid raw materials, at least two constant flow pumps respectively connected to the at least two chemical liquid raw materials tanks, and the at least two constant flow pumps. A mixing tank for mixing the at least two chemical liquid raw materials, a liquid flow controller connected to the mixing tank and measuring a flow rate of the mixed solution flowing out of the mixing tank, and connected to the liquid flow controller and vaporizing the mixed solution An injector, and a reaction chamber connected to the injector.
priorityDate 2003-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 20.