| abstract |
The present invention relates to a sulfonyldiazomethane compound represented by the following formula (1).n n n <Formula 1>n n n n n n n n In the formula, R represents a hydrogen atom or an alkyl or alkoxy group having 1 to 4 carbon atoms, G represents SO 2 or CO, R 3 represents an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 14 carbon atoms, and p is 1 or 2, q is 0 or 1, satisfies p + q = 2, n is 2 or 3, n 'is 0 or 1, m is an integer from 3 to 11, k is 0 to 4 Is an integer.n n n The sulfonyl diazomethane of the present invention and the chemically amplified resist material using the same contain a plurality of long-chain alkoxyl groups in the sulfonyl diazomethane, so that the resolution and the focus margin are excellent, and the line width fluctuates even when the PED is extended for a long time. There is little shape deterioration, there is little foreign material after peeling after image development after application | coating, the pattern profile shape after image development is excellent, and it has high resolution suitable for microfabrication. |