| abstract |
The novel sulfonic acid ester compound of the general formula (1), wherein R 1 to R 3 are H, F or C 1-20 alkyl or fluoroalkyl group, and at least one of R 1 to R 3 contains F. Polymers comprising units derived from sulfonic acid ester compounds are used as base resins to form resist compositions that are sensitive to high energy rays, maintain high transparency at wavelengths of 200 nm or less, and have improved alkali soluble contrast and plasma etching resistance. . |