abstract |
The present invention relates to an organic ultrathin film for lithography, and more particularly, formed by coating a surface of a solid substrate with a sulfonate organic compound represented by Formula 1, an azo compound represented by Formula 2, or an organic polymer represented by Formula 3 below: As a thin film, since the thickness of the thin film is a few nm level and uniform surface, the present invention relates to an organic ultrathin film for lithography that can be utilized in the field of electronic device manufacturing or microfabrication technology. |