http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20040065900-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/E03C1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/E03C1-282 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate | 2003-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6e2b20fba6933692e818c6d5dbd4d8c7 |
| publicationDate | 2004-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20040065900-A |
| titleOfInvention | Gas suppling apparatus for semiconductor equipment |
| abstract | The present invention relates to a gas supply device for semiconductor manufacturing equipment, comprising: a carrier gas supply source for supplying a carrier gas; A plurality of process gas supply sources for supplying a predetermined process gas; A plurality of injection valves respectively connected to the process gas supply source through a plurality of process gas supply lines and individually connected to the transport gas supply source through a plurality of transport gas supply lines; A gas supply apparatus for a semiconductor manufacturing equipment having a plurality of gas discharge lines connecting each injection valve and a reaction chamber to supply vaporized process gases through the injection valve, wherein the flow path is provided on the plurality of carrier gas supply lines. A plurality of valves for opening and closing the is characterized in that each further provided.n n n As described above, a plurality of injection valves are arranged in parallel so as to individually supply a plurality of injection valves from a carrier gas supply source, and a plurality of valves for opening and closing a flow path on the carrier gas supply line, respectively. In addition, the valve is closed to check the flow state of the gas actually supplied to the set value in a state in which the gas supplied from the carrier gas supply source is blocked from being supplied to each injection valve. There is an advantage to this. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101632542-B1 |
| priorityDate | 2003-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 17.