| abstract |
A non-ionic surfactant, a chelating agent and a chelating accelerator represented by the following general formula (1) and / or general formula (2), wherein the foreign matter on the semiconductor substrate after the CMP process is excellent in the removal of particulate matter and ionic foreign matter. Provide a cleaning liquid.n n n n n CH 3- (CH 2 ) l -O- (C m H 2m O) n -Xn n n n n (L, m, and n in the formula each independently represent a positive number, and X represents a hydrogen atom or a hydrocarbon group)n n n n n CH 3- (CH 2 ) a -O- (C b H 2b O) d- (C x H 2x O) y -Xn n n n n (A, b, d, x and y in the formula each independently represent a positive number, b and x are different from each other. X represents a hydrogen atom or a hydrocarbon group) |