http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20040063156-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-121 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D487-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D209-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D409-14 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D487-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D209-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D409-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2002-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2004-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20040063156-A |
| titleOfInvention | Bisimide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition |
| abstract | The present invention provides a novel bisimide compound useful as an acid generator or a raw material for heat-resistant polymer synthesis of a chemically amplified resist composition used in the manufacture of semiconductor devices and the like, an acid generator and a resist composition using the same, and a pattern forming method using the composition. Furthermore, the present invention relates to a bis (N-hydroxy) phthalimide compound useful as an intermediate of a bisimide compound, for example, an intermediate of a functional compound such as a heat resistant polymer, a photosensitive material, and the like. Provided are an acid generator and a resist composition and a method of forming a pattern using the composition.n n n n Formula 1n n n n n n n n n In the above formula, R and A 1 are each as described in Claim 1. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101502617-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9034560-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9475390-B2 |
| priorityDate | 2001-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 455.