| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3162
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-905 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-0035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-00 |
| filingDate |
2002-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf964a0010343b8e75e36b5aa535e459
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c0c3857fdb5d2695e75451c25843f3c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5fe46aa8ec383073de837d8d6d54da6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d58cc68660324c0a837eeb1c4c43e89
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_70f406554ca6050be05c20aededbeee7 |
| publicationDate |
2004-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20040057470-A |
| titleOfInvention |
Method for deposition chamber cleaning and apparatus for depositing capable of in-situ cleaning |
| abstract |
The present invention discloses a deposition chamber cleaning method and a deposition apparatus capable of in-situ cleaning. A first gas that reacts with a metal included in the metal oxide to generate a reactant and a second gas that decomposes the reactant are introduced into a deposition chamber in which the metal oxide is deposited. Subsequently, the metal oxide is reacted with the first and second gases to remove the metal oxide to clean the deposition chamber. According to the method, cleaning can be performed in a short time without opening or separating the deposition chamber. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011047302-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140114735-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011047302-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140104767-A |
| priorityDate |
2002-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |