http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20040051326-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-18 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-04 |
filingDate | 2002-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4cf3c63d2c50d72370dec6b3d00d78e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32f5bf789c9164a5b4dabad1e6b7ae12 |
publicationDate | 2004-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-20040051326-A |
titleOfInvention | Siloxane-Based Resin and Method for Forming a Low Dielectric Patterned Film by Using the Same |
abstract | The present invention relates to one silane compound having an acid and heat labile functional group, a siloxane resin prepared by hydrolysis and polycondensation of one or two other silane compounds, and the resin together with a photoacid generator and an organic solvent. The present invention relates to a method of forming a low dielectric pattern film including a process of heat-treating a pattern obtained by dissolving and coating on a substrate, followed by exposure and development. Since the siloxane-based resin of the present invention serves as a low dielectric and a photoresist, By using this, there is no need to separately perform the interlayer insulation film forming process and the pattern forming process in manufacturing a semiconductor device, thereby simplifying the process. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9291899-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101139157-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100715187-B1 |
priorityDate | 2002-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 103.