http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20040038386-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H02N13-00
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4585
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-505
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-513
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6831
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
filingDate 2002-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_319f1a7168a6ae8fb977745977531e18
publicationDate 2004-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20040038386-A
titleOfInvention High density plasma oxide deposition apparatus having a guide ring and a semiconductor device manufacturing method using the same
abstract The present invention relates to a high density plasma oxide film deposition apparatus for embedding a high density plasma (HDP) oxide film in a trench of a semiconductor substrate, and more particularly, a guide ring for protecting the semiconductor substrate in a chamber (CHAMBER). The distance between the semiconductor substrate and the guide ring in a form of a GUIDE RING, or the nitride film for liner (LINER) deposited on the trench before the HDP oxide film is deposited to a predetermined thickness. It is to prevent tearing of the nitride film for the liner of the bevel portion on the semiconductor substrate by minimizing the attack (ATTACK) of the plasma ion (PLASMA ION) generated by the process.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150098452-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100790392-B1
priorityDate 2002-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419579069

Total number of triples: 20.